from Wiktionary, Creative Commons Attribution/Share-Alike License

  • n. Plural form of photomask.


Sorry, no etymologies found.


  • Mr. Chin, also 38, in September downgraded Photronics Inc., a company that makes products called reticles and photomasks that help trace patterns of circuitry on semiconductor wafers.

    Semiconductor-Equipment Manufacturing

  • PLAB is a manufacturer of photomasks, which are precision photographic quartz plates containing microscopic images of electronic circuits.

  • UTEK develops, manufactures and markets photolithography equipment designed to reduce the cost of ownership for manufacturers of integrated circuits, including advanced packaging processes, photomasks, thin film magnetic recording devices and micromachined components.

    3 Electrical Manufacturing Stocks to Watch - Seeking Alpha

  • Through its automation, MaskCompose helps enable seamless execution of multiple, critical steps in reticle and wafer synthesis, implementation, and documentation of data-intensive and expensive photomasks and wafer stepper layouts.

  • A key element in the manufacture of semiconductors and flat panel displays, photomasks are used to transfer circuit patterns onto semiconductor wafers and flat panel substrates during the fabrication of integrated circuits, a variety of flat panel displays and, to a lesser extent, other types of electrical and optical components.

  • A live webcast of both presentations can be accessed at photomasks.

  • Utilized in a mix-and-match strategy, J-FIL's resolution and cost advantages can be deployed on specific critical layers, while its use of commercially available photomasks, exposure sources and resists makes for straightforward integration with the industry's existing optical lithography infrastructure.

    The Earth Times Online Newspaper

  • SEMATECH and Carl Zeiss plan to design and develop the industry's first-ever actinic aerial image metrology system (AIMS) for defect review of EUV photomasks. all content

  • The jointly developed system - called PROVE - demonstrated the measurement capability for advanced photomasks for the 32 nm node and below.

    Nano Tech Wire

  • The system can be fully extended to measure EUV photomasks.

    Nano Tech Wire


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