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Examples
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NuFlare has the world's top market share in e-beam mask writing systems and is a technology leader in mask writing systems with its production, R&D and support sites in Japan, USA, Germany, Korea and Taiwan.
unknown title 2011
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Higher levels of e-beam energy produced p-type areas, while lower levels produced n-type areas.
innovations-report 2010
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Higher levels of e-beam energy produced p-type areas, while lower levels produced n-type areas.
D Mag - News 2010
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"A high e-beam energy converts the whole SOG structure to more of a network, and then you have more oxygen than hydrogen, resulting in a p-type doping."
D Mag - News 2010
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Higher levels of e-beam energy produced p-type areas, while lower levels produced n-type areas.
D Mag - News 2010
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Cutting-edge innovations designed to address a host of critical lithography challenges are outlined in a variety of technical areas, including advanced photoresist materials, mask blanks and process technologies for extreme ultraviolet ( "EUV") lithography; double-patterning techniques for optical microlithography; lithographic techniques for self-assembly; and advances in electron-beam ( "e-beam") lithography, nanometrology, and nanoimprint technologies, among others.
Nano Tech Wire 2010
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The students were the first to take a new nine-hour e-beam nanolithography training session and will go on to apply their new skills in the fields of biomedicine, micro - and nano-electro-mechanical systems (M/NEMS), microfluidics, opto-electronics, microelectronics, energy and pharmaceuticals.
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"A high e-beam energy converts the whole SOG structure to more of a network, and then you have more oxygen than hydrogen, resulting in a p-type doping."
innovations-report 2010
-
Cutting-edge innovations designed to address a host of critical lithography challenges are outlined in a variety of technical areas, including advanced photoresist materials, mask blanks and process technologies for extreme ultraviolet ( "EUV") lithography; double-patterning techniques for optical microlithography; lithographic techniques for self-assembly; and advances in electron-beam ( "e-beam") lithography, nanometrology, and nanoimprint technologies, among others.
Nano Tech Wire 2010
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"A high e-beam energy converts the whole SOG structure to more of a network, and then you have more oxygen than hydrogen, resulting in a p-type doping."
D Mag - News 2010
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