Definitions
from Wiktionary, Creative Commons Attribution/Share-Alike License.
- initialism Extreme UltraViolet; the highest energy, highest frequency, shortest wavelength end of the
ultraviolet EM band, overlapping withsoft X-rays .
Etymologies
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Examples
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That's why Woods and colleagues built an extreme ultraviolet sensor for SDO called the EUV Variability Experiment ( "EVE").
Science @ NASA 2010
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Cutting-edge innovations designed to address a host of critical lithography challenges are outlined in a variety of technical areas, including advanced photoresist materials, mask blanks and process technologies for extreme ultraviolet ( "EUV") lithography; double-patterning techniques for optical microlithography; lithographic techniques for self-assembly; and advances in electron-beam ( "e-beam") lithography, nanometrology, and nanoimprint technologies, among others.
Nano Tech Wire 2010
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Cutting-edge innovations designed to address a host of critical lithography challenges are outlined in a variety of technical areas, including advanced photoresist materials, mask blanks and process technologies for extreme ultraviolet ( "EUV") lithography; double-patterning techniques for optical microlithography; lithographic techniques for self-assembly; and advances in electron-beam ( "e-beam") lithography, nanometrology, and nanoimprint technologies, among others.
Nano Tech Wire 2010
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Could I really get the full sense of Denmark without experiencing this uniquely Scandinavian EUV?
Christine Negroni: My Carbon Neutral Sunday Drive Christine Negroni 2012
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It's an _N2/O2_ atmosphere like ours that much more easily can extend outside the magnetosphere at high enough EUV/FUV fluxes.
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Toshiba develops molecular photoresist technology for EUV lithography with world's first 20nm-scale generation process technology
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Toshiba has developed a high resolution photoresist (photo-sensitive film) essential for future application of EUV (extreme ultraviolet) lithography in semiconductor fabrication, and proved its viability with the world's first 20nm-scale generation process technology.
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Toshiba develops molecular photoresist technology for EUV lithography with world's first 20nm-scale generation process technology
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The solution lies in a transition to EUV lithography and photoresist based on low molecular materials.
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This document lists general guidelines to archive X-ray, Gamma-ray and EUV data at the HEASARC.
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